Semilab China

PMR-3000 Ion Implant Monitoring Tool

PMR-3000

Ion Implant Monitoring Tool

Based on significant improvements, the Semilab PMR-3000 enables in-line monitoring of implant processes on product wafers for immediate, accurate, and low-cost production control of implant systems and in-line monitoring for pre-anneal implant.

Features and System specifications:

• Implant dose

• Dose range 1×1010 cm-2 to 1×1016 cm-2

• Energy range 100 eV to 3 MeV

• Species As, B, P, BF2, In, Sb, C (application for other species under development)

• Process requirements - Unannealed implanted layers, Surface oxide

• Fully SEMI-compliant (300 mm) automation

• Overhead transport (OHT) available

• Fully compliant to Tier 1 contamination specs, including Class 1 minienvironment

• Two FOUPs capable of handling wafers up to 300 mm size

State of the art software:

• Recipe-based operation

• Host communication

• Different access levels