Semilab China

ACV-2200 epi layer resistivity

ACV-2200, ACV-3000, ACV-3100

The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to Schottky-CV or Hg-probe, and thus the output is a traditional CV doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.

The model includes complete automation, powerful software and excellent measurement repeatability.

Features and System specifications:

• Edge exclusion: 10 mm (standard ACV sensor) or 6 mm (rEE ACV sensor)

• Throughput: 6 wafers/hour (PTC + particle detection & ACV measurement in 5 pts). The treatment is recipe-dependent. Measurement time for one point: 55-70 seconds (stage motions + particle detection + ACV measurement)

• Number of measurement points, measurement area: No limit in measurement points; 1 mm

• Profile measurement depth: Like MOS CV, depth depends on resistivity and surface charge