Logitech Limited

DP Precision Polishing Systems

The Logitech DP Precision Polishing Systems were developed to address the issue of polishing times when processing semiconductor materials often describe as “hard” to polish within the industry. These systems have been designed for semi-automated final stage polishing of hard materials such as sapphire, silicon carbide (SiC) or gallium nitride (GaN).

Available as a single or four workstations, the DP Precision Polishing Systems can process materials up to 300mm (or multiple smaller samples) on the DP1 and 260mm per workstation (or multiple smaller samples) on the DP4. The DP systems feature special polishing carrier heads that apply high levels of down-force per carrier head onto the samples, whilst rotational speed and direction are fully controllable. This results in the highest level of sample throughput of any of the Logitech systems.

The capacity of the range of the DP Precision Polishing Systems make these ideal for small research laboratories through to production level environments.

The DP systems are chemically resistant to standard chemicals used in CMP applications, including sodium hypochlorite (Na OCL).