PVA TePla America, Inc

PHOTORESIST ASHING IoN 10V

SINGLE WAFER ASHING SYSTEM

The Photoresist AshingIoN 10V plasma system is a manual load single wafer RF plasma Ashing, RIE and Descum system. This low cost, mid-sized single wafer system is loaded with advanced features and targets the needs of small scale foundries, universities and start-up companies. The Photoresist AshingIoN 10V plasma system is equipped with new, state of the art components and software to precisely control processing parameters. This technology has been successfully used for power transistors, analog devices, sensors, optical devices, photonics, MEMS/MOEMS, bio devices, etc. The small footprint of the IoN 10V requires minimal laboratory space and provides for simple installation and maintenance. Leveling casters and brakes allow for easy installation and flexibility.

Features include:

• Small foot print design
• Stainless Steel chamber accommodating up to 8” wafers
• 7” Touch Screen PC Controller with auto and Manual mode operation
• User access control for process development and maintenance programming.
• Plug and play installation
• Pressure Control

Typical application:

• Photoresist stripping
• Wafer descum
• Wafer cleaning prior to wet etching
• SU-8 removal
• Etching of passivation layers
• Reactive IoN Etch (RIE) Configurable
• Batch Wafer System