Centrotherm international AG

High-temperature annealing and thermal treatment applications of wide band gap crystals

To optimize the yield for wide band gap (WBG) materials and semiconductor devices, stress-related defects and dislocations must be kept to a minimum. A method to reduce yield loss related to defects and dislocations is by thermal treatment of the crystals immediately after the growth process.

The high-temperature annealing furnace c.CRYSCOO HTA has especially been developed to significantly improve productivity and cost of ownership along the WBG materials and device value chain.

Due to its superior temperature control and uniformity c.CRYSCOO HTA outclasses conventional furnaces. The large process chamber allows the processing of over 12 boules, ingots or even 100 raw wafers simultaneously. This capacity in combination with a superior temperature homogeneity results in a higher yield per crystal.