Centrotherm international AG

Wuerttemberger Str. 3189143 Blaubeuren

Next-generation horizontal system for high-throughput 300 mm wafer processing

Next-generation horizontal system for high-throughput 300 mm wafer processing

Horizontal batch-type process system for multifold applications

Horizontal batch-type process system for multifold applications

High-temperature annealing and thermal treatment applications of wide band gap crystals

High-temperature annealing and thermal treatment applications of wide band gap crystals

Vertical wafer process system for R&D and production of Si-based semiconductors

Vertical wafer process system for R&D and production of Si-based semiconductors

Rapid Thermal Processing system for silicon and compound semiconductors

Rapid Thermal Processing system for silicon and compound semiconductors

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