Singulus Technologies AG

Four-Target-Module

Four-Target-Module (FTM) with 4 DC/RF Cathodes

Sputtering and Process Modules for Semiconductor and Magnetics – Features:

• DC/RF magnetron
• All sputter deposition modes selectable by recipe for all 4 cathodes
• LDD technology
• RF bias option
• Ultra-high vacuum technology
• Base pressure < 8*10-9 Torr
• Wafer heating and cooling

The Four-Target-Module (FTM) incorporates Linear Dynamic Deposition (LDD) technology in combination with up to four sputter targets in one vacuum chamber.