NOVA Measuring Instruments receives order for In-Situ Real-Time Profile Measurement Software for Advanced Memory Process

Wednesday, Feb 18, 2015

Nova Measuring Instruments (NVMI), a leading innovator and key provider of optical metrology solutions for advanced process control used in semiconductor manufacturing, announced today that it has received its first order for Real-time Profile Measurement solution, NovaRPM®, for real-time monitoring of advanced Etch processes.

The solution, which will be delivered to a major memory manufacturer, is a result of a close cooperation between Nova, a leading wafer fabrication equipment supplier and this memory customer. This effort is targeted to deliver a tighter Etch process control by combining the supplier's advanced Etch platform capabilities with Nova's advanced modeling software.

Nova's solution was selected due to its capability to deliver high accuracy real-time measurements within the complex process environment. This unique solution evolved from Nova's core competence in delivering optical modeling solutions that have proven to address challenging applications during the fabrication process.

"With this initial order for our Real-time Profile Measurement solution, we now see tangible demand for all our software solutions, reinforcing our confidence that our comprehensive software offering will represent a meaningful contributor to our market position in 2015 and beyond," said Eitan Oppenhaim, President and CEO of Nova. "This selection validates the competitive advantage that our solutions provide for controlling the most complex Etch processes. This milestone is a result of ongoing cooperation between several customers, a leading process equipment vendor, and Nova. It reaffirms our strategy that the growing technology complexity in process development can be better addressed through cooperation between process equipment vendors and process control vendors."


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